Number of items: 2.
Journal Article
Reddy, Nanda Kumar N and Akkera, Harish Sharma and Sekhar, Chandra M and Uthanna, S
(2019)
Influence of Ta2O5 Interfacial Oxide Layer Thickness on Electronic Parameters of Al/Ta2O5/p-Si/Al Heterostructure.
In: SILICON, 11
(1).
pp. 159-164.
Sekhar, Chandra M and Reddy, Nanda Kumar N and Rao, Venkata B and Rao, Mohan G and Uthanna, S
(2014)
Influence of sputter power on structural and electrical properties of TiO2 films for Al/TiO2/Si gate capacitors.
In: SURFACE AND INTERFACE ANALYSIS, 46
(7).
pp. 465-471.
This list was generated on Fri Apr 26 08:13:47 2024 IST.
