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Reddy, Nanda Kumar N and Akkera, Harish Sharma and Sekhar, Chandra M and Uthanna, S (2019) Influence of Ta2O5 Interfacial Oxide Layer Thickness on Electronic Parameters of Al/Ta2O5/p-Si/Al Heterostructure. In: SILICON, 11 (1). pp. 159-164.
Sekhar, Chandra M and Reddy, Nanda Kumar N and Rao, Venkata B and Rao, Mohan G and Uthanna, S (2014) Influence of sputter power on structural and electrical properties of TiO2 films for Al/TiO2/Si gate capacitors. In: SURFACE AND INTERFACE ANALYSIS, 46 (7). pp. 465-471.