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Rao, SR and Ishibashi, N and Nayak, B and Muniganti, H and Ambasana, N and Sahu, V and Gope, D and Devi, A (2022) Black-Box Behavioral DC-DC Converter IC Emission Model. In: 2022 IEEE International Symposium on Electromagnetic Compatibility and Signal/Power Integrity, EMCSI 2022, 1 - 5 August 2022, Spokane, pp. 570-574.
Devi, A and Satheesh, SK (2022) Global maps of aerosol single scattering albedo using combined CERES-MODIS retrieval. In: Atmospheric Chemistry and Physics, 22 (8). pp. 5365-5376.
Chaudhury, G and Basumatari, M and Darji, CB and Ahmed, AF and Borah, D and Sah, RK and Devi, A and Hazarika, N and Dutta, G (2021) Economic significance of wild bioresources to rural communities in the Eastern Himalayan state of Assam, Northeast India. In: Trees, Forests and People, 5 .
Antony, A and Devi, A and Varghese, K (2021) High Throughput Hardware for Hoeffding Tree Algorithm with Adaptive Naive Bayes Predictor. In: 6th International Conference for Convergence in Technology, I2CT 2021,, 2-4Apr 2021, Pune.
Devi, A and Shivashankar, SA and Samuelson, AG (2002) MOCVD of aluminium oxide films using aluminiurn beta-diketonates as precursors. In: Journal de Physique IV - Proceedings, 12 (PR4). 139-146 .
Mane, Anil U and Shalini, K and Wohlfart, A and Devi, A and Shivashankar, SA (2002) Strongly oriented thin films of $Co_3O_4$ deposited on single-crystal MgO(1 0 0) by low-pressure, low-temperature MOCVD. In: Journal of Crystal Growth, 240 (1-2). pp. 157-163.
Singh, MP and Mukhopadhayay, S and Devi, A and Shivashankar, SA (2001) A study of nucleation and growth in MOCVD: The growth of thin films of alumina. In: Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Strutures, Nov 27-Dec 1 2000, Boston, MA, P6471-P6476.
Patnaik, S and Row, TNG and Raghunathan, L and Devi, A and Goswami, J and Shivashankar, SA and Chandrasekaran, S and Robinson, WT (1996) Low-temperature structure of two copper-based precursors for MOCVD: Aquabis(tert-butyl acetoacetato)copper(II) and Bis(dipivaloylmethanido)copper(II). In: Acta Crystallographica Section C, 52 (part 4). pp. 891-894.
Goswami, J and Raghunathan, L and Devi, A and Shivashankar, SA and Chandrasekaran, S (1996) Chemical vapour deposition of thin copper films using a new metalorganic precursor. In: Journal of Materials Science Letters, 15 (7). pp. 573-575.
Goswami, J and Shivashankar, SA and Raghunathan, L and Devi, A and Ramanathan, KV (1994) Comparison of growth and microstructure of copper films deposited from different Cu(II) precursors. In: Advanced Metallization for Devices and Circuits—Science Technology and Manufacturing III, 4-8 April 1994, Pittsburgh, PA, USA, pp. 691-696.