Rajeswaran, B and Umarji, AM (2023) Comparing the effect of synthesis techniques on the semiconductor-metal transition of VO2 thin films. In: Materials Letters, 339 .
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Abstract
We compare the effect of two synthesis methods namely Chemical Vapor Deposition (CVD) and Ultrasonic Nebulized Spray Pyrolysis of Aqueous Combustion Mixture (UNSPACM) on the Semiconductor-Metal Transition (SMT) characteristics of VO2 thin films. The SMT characteristics of the films are measured electrically and optically. CVD films show a lower resistance ratio and SMT strength, whereas films synthesized via UNSPACM are rougher. We ascribe the reason for the observed behaviour to morphology and off-stoichiometry arising from the deposition process. © 2023 Elsevier B.V.
Item Type: | Journal Article |
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Publication: | Materials Letters |
Publisher: | Elsevier B.V. |
Additional Information: | The copyright for this article belongs to Elsevier B.V. |
Keywords: | Morphology; Spray pyrolysis; Thin films; Vanadium dioxide, Chemical vapour deposition; Electrical quality; Low resistance; Optical qualities; Semiconductor-metal transition; Synthesis method; Synthesis techniques; Ultrasonic nebulized spray pyrolysis of aqueous combustion mixtures; Vapor deposition films; VO 2 thin films, Chemical vapor deposition |
Department/Centre: | Division of Chemical Sciences > Materials Research Centre |
Date Deposited: | 20 Mar 2023 07:05 |
Last Modified: | 20 Mar 2023 07:05 |
URI: | https://eprints.iisc.ac.in/id/eprint/81008 |
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