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Microstructural, surface morphological, and magnetic properties of oblique angle deposited Co thin films on ion-beam fabricated self-organized Si substrates

Patel, SP and Basu, T and Kumar, M and Mishra, P and Som, T (2022) Microstructural, surface morphological, and magnetic properties of oblique angle deposited Co thin films on ion-beam fabricated self-organized Si substrates. In: Materials Letters, 308 .

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Official URL: https://doi.org/10.1016/j.matlet.2021.131099

Abstract

Abstract The microstructural, surface morphological, and magnetic properties of Co thin films grown, under oblique angle deposition, on low energy (500 eV) ion-beam fabricated self-organized rippled-Si substrates are presented. All films show the hexagonal-close-packed structure with the majority of the Co grains oriented along the (101‾2) and (0002) directions. Interestingly, Co film morphology follows the underlying ripple topography up to a thickness of 15 nm, whereas the conformal growth disappears at higher thicknesses (viz. 30 and 60 nm). The thicker films show the signature of tilted columnar structures. Further, a strong uniaxial magnetic anisotropy is observed for all films with the easy axis of magnetization perpendicular to the direction of the ripple wave vector. © 2021 Elsevier B.V.

Item Type: Journal Article
Publication: Materials Letters
Publisher: Elsevier B.V.
Additional Information: The copyright for this article belongs to the Elsevier B.V.
Keywords: Deposition; Fabrication; Ion beams; Magnetism; Thin films; Topography, Co thin films; Hexagonal closest packed structures; Lower energies; Magnetic properties of co; Micro-structural; Oblique angles; Oblique-angle deposition; Rippled-si; Self-organised; Si substrates, Magnetic anisotropy
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Date Deposited: 02 Jul 2022 04:35
Last Modified: 02 Jul 2022 04:35
URI: https://eprints.iisc.ac.in/id/eprint/74028

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