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Advanced nanopatterning using scanning probe technology

Talukder, S and Gogoi, B and Kumar, P and Pratap, R and Maoz, R and Sagiv, J (2019) Advanced nanopatterning using scanning probe technology. In: 2017 International Conference on Nanotechnology: Ideas, Innovations and Initiatives, ICN:3i 2017, 6 - 8 December 2017, Roorkee, pp. 740-743.

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Official URL: https://doi.org/10.1016/j.matpr.2019.06.480


This paper demonstrates two different lithographic techniques for micro/nanofabrication, viz. electrolithography technique driven by electromigration, and constructive lithography driven by anodic oxidation. The principle of electrolithography is based on electric field induced material transport which can be used for drawing patterns having dimensions from a few nanometres to a few hundred micrometres. Here, a thin Cr film is used as a masking layer and a polymer layer beneath it is used as a pattern transfer layer. A negatively biased scanning probe is used to perform electromigration on the metal film. The best resolution achieved with this technique is 9 nm. On the other hand, with the help of constructive lithography, micro/nano patterns are drawn on a highly ordered organosilane monolayer, self-assembled on silicon, using localized chemical reaction induced by an electrically biased tip or a focused e-beam.

Item Type: Conference Paper
Publication: Materials Today: Proceedings
Publisher: Elsevier Ltd
Additional Information: The copyright for this article belongs to Elsevier Ltd.
Keywords: Constructive lithography; Electrolithography; Fabrication; Lithography
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 06 Dec 2022 07:06
Last Modified: 06 Dec 2022 07:06
URI: https://eprints.iisc.ac.in/id/eprint/78271

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