Micro Electrolithography System Development

Kumar, S and Abraham, E and Talukder, S and Kumar, P and Pratap, R (2018) Micro Electrolithography System Development. In: 4th IEEE International Conference on Emerging Electronics, ICEE 2018, 17 - 19 December 2018, Bengaluru.

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Abstract

The recently developed technique of micro-nano pattern drawing by electrolithography process necessitates controlled probe-tip movement on a predefined path. Here we report development of a specific micropositioner system for drawing patterns at micrometer scale. Effect of different parameters on the patterns is studied. Probe-tip velocity and tip force are found to have major impact on the pattern-dimension.

Item Type:	Conference Paper
Publication:	2018 4th IEEE International Conference on Emerging Electronics, ICEE 2018
Publisher:	Institute of Electrical and Electronics Engineers Inc.
Additional Information:	The copyright for this article belongs to the Institute of Electrical and Electronics Engineers Inc.
Keywords:	Electronics engineering; Electronics industry, Drawing pattern; Electrolithography; Micro-nano; Micrometer scale; Micropositioner; Patterning; System development; Tip forces, Probes
Department/Centre:	Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy) Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	01 Aug 2022 09:09
Last Modified:	01 Aug 2022 09:09
URI:	https://eprints.iisc.ac.in/id/eprint/75097

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