Up a level |
Kolla, Lakshmi Ganapathi and Ding, Yiming and Misra, Durga and Bhat, Navakanta (2018) Interface states reduction in atomic layer deposited TiN/ZrO2/Al2O3/Ge gate stacks. In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 36 (2).
Addepalli, Suresh and Kolla, Lakshmi Ganapathi and Suda, Uthanna (2017) Electrical, optical, structural and chemical properties of Al2TiO5 films for high-kappa gate dielectric applications. In: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 57 . pp. 137-146.