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Mehrotra, S and Kalyan, D and Makineni, SK and Santra, S (2024) Oxide growth characteristics, kinetics and mechanism of rutile formation on pure titanium. In: Vacuum, 219 .
Jithin, MA and Ganapathi, KL and Ambresh, M and Nukala, P and Udayashankar, NK and Mohan, S (2022) Development of titanium nitride thin film microheaters using laser micromachining. In: Vacuum, 197 .
K, M and Fernandes, JM and Fernandes, BJ and Bindu, K and Ramesh, KP (2022) Photocatalytic degradation of organic textile dyes using tellurium-based metal alloy. In: Vacuum, 199 .
Nabhiraj, PY and Menon, Ranjini and Rao, Mohan G and Mohan, S and Bhandari, RK (2010) Optimization of ion energy spread in inductively coupled plasma source designed for focused ion beam applications. In: Vacuum, 85 (2). pp. 344-348.
Nimisha, CS and Ganapathi, M and Munichandraiah, N and Rao, G Mohan (2009) Studies on the target conditioning for deposition of $LiCoO_{2}$ films. In: Vacuum, 83 (6). pp. 1001-1006.
Yuvaraj, D and Rao, Narasimha K (2008) Optical and electrical properties of ZnO films deposited by activated reactive evaporation. In: Vacuum, 82 (11). pp. 1274-1279.
Neyvasagam, K and Soundararajan, N and Venkatraman, V and Ganesan, V (2007) Ellipsometric studies on cupric telluride thin films. In: Vacuum, 82 (1). pp. 72-77.
Saravanan, S and Anantharaman, MR and Venkatachalam, S and Avasthi, DK (2007) Studies on the optical band gap and cluster size of the polyaniline thin films irradiated with swift heavy Si ions. In: Vacuum, 86 (1). pp. 56-60.
Patra, SK and Rao, Mohan G (2004) Electrical properties of diamond-like carbon films grown using ECR plasma decomposition of methane. In: Vacuum, 74 (1). pp. 93-97.
Komath, Manoj and Rao, Mohan G and Mohan, S (1999) Studies on the optimisation of unbalanced magnetron sputtering cathodes. In: Vacuum, 52 (3). pp. 307-311.
Senthil Nathan, S and Muralidhar, GK and Mohan Rao, G and Mohan, S (1998) Study of the processes occurring when sputtering YBa2Cu3O7-x in pure oxygen. In: Vacuum, 49 (03). pp. 221-225.
Marhas, Manmeet Kaur and Balakrishnan, K and Saravanan, P and Ganesan, V and Srinivasan, R and Kanjilal, D and Mehta, GK and Vedwyas, M and Ogale, SB and Pai, SP and Rao, MSR and Pinto, R and Rao, GM and Senthilnathan, S and Mohan, S (1997) Structural and transport properties of high energy ion irradiated YBCO. In: Vacuum, 48 (12). 983-988 .
Chandran, M and Murthy, Krishna MV (1997) A Markov chain model for a turbomolecular pump--theory and experiments. In: Vacuum, 48 (11). pp. 899-911.
Swarnalatha, M and Sravani, C and Gunasekhar, KR and Muralidhar, GK and Mohan, S (1997) Estimation of density of charge species in a triode discharge system. In: Vacuum, 48 (10). pp. 845-848.
Rajanna, K and Nayak, MM and Krishnamurthy, R and Mohan, S (1997) Low-cost thin film pressure transducer. In: Vacuum, 48 (6). pp. 521-524.
Nathan, Senthil S and Muralidhar, GK and Rao, Mohan G and Mohan, S (1997) Studies of process parameter controlled composition variation in sputtered $YBa_2Cu_3O_{7-x}$ films. In: Vacuum, 48 (2). pp. 113-118.
Swarnalatha, M and Mohan, S (1997) Twin facing target sputtering system for the deposition of multilayer and alloy films. In: Vacuum, 48 (1). pp. 15-19.
Chandra, R and Krishnamurthy, MV and Jacob, S and Kasthurirengan, S and Karunanithi, R (1996) Effect of vacuum on the mass flow characteristics of a horizontal liquid nitrogen transfer line. In: Vacuum, 47 (11). pp. 1379-1384.
Bhatiacharyya, S and Kanjilal, D and Sayeed, A and Meenakshi, V and Subramanyam, SV (1996) Electronic properties of ion irradiated amorphous carbon films prepared by plasma assisted CVD method. In: Vacuum, 47 (11). pp. 1285-1288.
Shivalingappa, L and Srinivasan, MP and Mohan, S (1996) Digital mixer for quartz crystal thickness monitor. In: Vacuum, 47 (1). pp. 87-89.
Mohan, S and Krishna, Ghanashyam M (1995) A review of ion beam assisted deposition of optical thin films. In: Vacuum, 46 (7). pp. 645-659.
Krishna, Ghanashyam M and Kanakaraju, S and Mohan, S (1995) Structure and composition related properties of titania thin films. In: Vacuum, 46 (1). pp. 33-36.
Al-Robaee, Mansour S and Subbanna, GN and Rao, Narasimha K and Mohan, S (1994) Studies of the optical and structural properties of ion-assisted deposited $Al_20_3$ thin films. In: Vacuum, 45 (1). pp. 97-102.
Shivalingappa, L and Rao, Narasimha K and Mohan, S (1993) Rotating crucible electron beam evaporation technique for the deposition of multicomponent oxide films. In: Vacuum, 44 (10). pp. 1031-1035.
Muralidhar, GK and Rao, Mohan G and Krishna, Ghanashyam M and Rao, Narasimha K and Menon, AG and Balasubramanian, TV and Mohan, S (1993) Study of discharge characteristics in pure argon and oxygen during DC sputtering of YBaCuO films. In: Vacuum, 44 (10). pp. 1049-1052.
Muralidhar, GK and Mohan, S and Menon, AG and Krishnarajulu, B (1992) Wide beam ion optics of mass analyser for ion implanters. In: Vacuum, 43 (4). pp. 293-295.
Rao, Mohan G and Mohan, S (1991) Influence of oxygen partial pressure on the glow discharge characteristics during DC reactive magnetron sputtering. In: Vacuum, 42 (9). pp. 515-517.
Gunasekhar, KR and Mohan, S (1991) Discharge studies in a triode ion plating system. In: Vacuum, 42 (10-11). pp. 661-663.
Sheshadri, TS (1991) Electromagnetic force density distribution in MPD thrusters. In: Vacuum, 42 (14). pp. 923-925.
Shivalingappa, L and Srinivasan, MP and Mohan, S (1991) Highly stable oscillator for quartz crystal thickness monitor. In: Vacuum, 42 (3). pp. 203-204.
Mohanrao, G and Mohan, S (1990) Design aspects and performance evaluation of a planar magnetron. In: Vacuum, 40 (3). pp. 313-314.
Ramprasad, BS and Radha, TS (1974) Optimum geometry for uniform deposits on a rotating substrate from a point source. In: Vacuum, 24 (4). pp. 165-166.
Ramprasad, BS and Radha, TS (1973) On some design aspects of rotary vane pumps. In: Vacuum, 23 (7). pp. 245-249.
Nandagopa, MR and Gopalakrishna, HV (1973) Long duration surge voltage breakdown at low pressure. In: Vacuum, 23 (6). p. 205.
Prabhakar, BR and Nandagopal, MR (1972) Epoxy resin chamber for high voltage breakdown studies in high vacuum. In: Vacuum, 22 (2). pp. 47-50.
