Advancements in Space-based NUV Spectrography: Precision Fabrication and Evaluation of an Optical Slit using Optical Lithography and Deep Reactive Ion Etching

Nair, BG and Chandra, BP and Safonova, M and Sultana, S and Yadhukrishnan, SV and Nawaz, N and Ghatul, S and Jain, S and Babu, M and Mohan, R and Murthy, J (2024) Advancements in Space-based NUV Spectrography: Precision Fabrication and Evaluation of an Optical Slit using Optical Lithography and Deep Reactive Ion Etching. In: Space Telescopes and Instrumentation 2024: Ultraviolet to Gamma Ray, 16 June 2024through 21 June 2024, Yokohama.

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Abstract

This article describes the development of a space-based near-Ultraviolet (NUV) spectrograph, focusing on the intricate fabrication and meticulous evaluation of an optical slit employing advanced techniques such as optical lithography and deep reactive ion etching (DRIE). The fabrication process entails a precise definition of the slit pattern on silicon wafer substrates through optical lithography, followed by the transfer of the pattern into the substrate material using DRIE. The resultant optical slit boasts sub-angstrom surface roughness and nanometer-scale slit width uniformity, essential for achieving superior spectrographic performance. Through comprehensive evaluation methodologies, including interferometry and spectrophotometry, the optical slit's spectral resolution, throughput, and stray light rejection are rigorously examined. These breakthroughs promise to elevate the sensitivity, resolution, and dependability of space-based NUV spectrographic instruments, enabling deeper exploration of celestial phenomena and cosmic evolution. © 2024 SPIE.

Item Type:	Conference Paper
Publication:	Proceedings of SPIE - The International Society for Optical Engineering
Publisher:	SPIE
Additional Information:	The copyright for this article belongs to the publisher.
Keywords:	Atomic emission spectroscopy; Cosmology; Fiber optic sensors; Laser beams; Reactive ion etching; Space optics; Spectral resolution; Spectrophotometers; Spectrophotometry; Stray light; Ultraviolet spectrographs, Deep Reactive Ion Etching; Deep reactive-ion etchings; Dumbbell slit; Near ultraviolet; Optical slit; Optical-; Space instrumentations; Space-based; Spectrography; Ultraviolet, Silicon wafers
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	23 Nov 2024 18:32
Last Modified:	23 Nov 2024 18:32
URI:	http://eprints.iisc.ac.in/id/eprint/86845

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