Sujatha, Ch and Rao, Mohan G and Uthanna, S (2002) Characteristics of indium tin oxide films deposited by bias magnetron sputtering. In: Materials Science and Engineering B, 94 (1). pp. 106-110.
![]() |
PDF
Characteristics_of_indium_tin_oxide.pdf Restricted to Registered users only Download (137kB) | Request a copy |
Abstract
Indium tin oxide coatings have been deposited on glass substrates with substrate bias as a process parameter along with substrate temperature. It was found that films deposited with substrate heating and/or substrate bias were polycrystalline in nature and predominantly (400) oriented. The results are correlated to microstructural variation due to the process parameters. Films with lowest sheet resistance, 7.6 ohm/sq and electron concentration of $8.1 \times10^{21}\hspace{2mm}cm^{-3}$ have been achieved in case of films deposited at $370^o\hspace{2mm}C$ with a substrate bias of + 18 V
Item Type: | Journal Article |
---|---|
Publication: | Materials Science and Engineering B |
Publisher: | Elsevier |
Additional Information: | Copyright of this article belongs to Elsevier. |
Keywords: | Transparent conductors;Bias sputtering;Indium tin oxide |
Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics |
Date Deposited: | 02 Jun 2006 |
Last Modified: | 19 Sep 2010 04:28 |
URI: | http://eprints.iisc.ac.in/id/eprint/7370 |
Actions (login required)
![]() |
View Item |