Amorphous Germanium for Mid Infrared Photonics

Mere, V and Kallega, R and Selvaraja, S K (2019) Amorphous Germanium for Mid Infrared Photonics. In: Workshop on Recent Advances in Photonics, WRAP 2019 December, 13 December 2019 through 14 December 2019, Guwahati; India..

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Abstract

We present a low-temperature plasma-enhanced-chemical-vapor-deposition of amorphous germanium films for Mid-infrared photonics. A film transparency of 3.2 to 8 μm with a minimum average roughness of 0.26 nm is achieved by tuning the deposition parameters. © 2019 IEEE.

Item Type:	Conference Paper
Publication:	2019 Workshop on Recent Advances in Photonics, WRAP 2019
Publisher:	IEEE
Additional Information:	cited By 0; Conference of 2019 Workshop on Recent Advances in Photonics, WRAP 2019 ; Conference Date: 13 December 2019 Through 14 December 2019; Conference Code:158197
Keywords:	Germanium; Infrared devices; Plasma CVD; Plasma enhanced chemical vapor deposition; Silicon photonics; Temperature, Amorphous germanium; Deposition Parameters; Film transparency; Germanium on silicons; Low temperature plasmas; Midinfrared, Optical waveguides
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	31 Aug 2020 10:57
Last Modified:	31 Aug 2020 10:57
URI:	http://eprints.iisc.ac.in/id/eprint/65089

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