Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices

Jithin, MmA and Ganapathi, Kolla Lakshmi and Vikram, G N V R and Udayashankar, N K and Mohan, S (2018) Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices. In: SENSORS AND ACTUATORS A-PHYSICAL, 272 . pp. 199-205.

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Abstract

Titanium nitride (TiN) thin films are deposited on Si/SiO2 substratesby using Pulsed DC magnetron sputtering and are characterized for their structural, mechanical and electrical properties for their application as localized heating elements in microsystem devices. The influence of substrate temperature on the properties of TiN films has been investigated. The correlation between the structural orientation with mechanical and electrical properties has been established. The films deposited at a substrate temperature of 300 degrees C have shown better structural, mechanical and electrical properties. This film has been chosen for the fabrication of microheater and its characterization. A maximum temperature of 250 degrees C is achieved by applying a power of 2.8 W to the microheater. (C) 2018 Elsevier B.V. All rights reserved.

Item Type:	Journal Article
Publication:	SENSORS AND ACTUATORS A-PHYSICAL
Publisher:	ELSEVIER SCIENCE SA, PO BOX 564, 1001 LAUSANNE, SWITZERLAND
Additional Information:	Copy right for the article belong to ELSEVIER SCIENCE SA, PO BOX 564, 1001 LAUSANNE, SWITZERLAND
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	11 Apr 2018 19:58
Last Modified:	11 Apr 2018 19:58
URI:	http://eprints.iisc.ac.in/id/eprint/59511

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