Effect of radio frequency power and thickness on the electrochemical properties of Li2-x MnO3-y thin films

Rao, Yellareswara K and Shanmughasundaram, D and Penki, Tirupathi Rao and Nookala, Munichandraiah and Rao, Mohan G (2015) Effect of radio frequency power and thickness on the electrochemical properties of Li2-x MnO3-y thin films. In: JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 19 (3). pp. 703-713.

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Abstract

In the present work, Li2-x MnO3-y (LMO) thin films have been deposited by radio frequency (RF) reactive magnetron sputtering using acid-treated Li2MnO3 powder target. Systematic investigations have been carried out to study the effect of RF power on the physicochemical properties of LMO thin films deposited on platinized silicon substrates. X-ray diffraction, electron microscopy, surface chemical analysis and electrochemical studies were carried out for the LMO films after post deposition annealing treatment at 500 A degrees C for 1 h in air ambience. Galvanostatic charge discharge studies carried out using the LMO thin film electrodes, delivered a highest discharge capacity of 139 mu Ah mu m(-1) cm(-2) in the potential window 2.0-3.5 V vs. Li/Li+ at 100 W RF power and lowest discharge capacity of 80 mu Ah mu m(-1) cm(-2) at 75 W RF power. Thereafter, the physicochemical properties of LMO films deposited using optimized RF power 100 W on stainless steel substrates has been studied in the thickness range of 70 to 300 nm as a case study. From the galvanostatic charge discharge experiments, a stable discharge capacity of 68 mu Ah mu m(-1) cm(-2) was achieved in the potential window 2.0-4.2 V vs. Li/Li+ tested up to 30 cycles. As the thickness increased, the specific discharge capacity started reducing with higher magnitude of capacity fading.

Item Type:	Journal Article
Publication:	JOURNAL OF SOLID STATE ELECTROCHEMISTRY
Publisher:	SPRINGER
Additional Information:	Copy right for this article belongs to the SPRINGER, 233 SPRING ST, NEW YORK, NY 10013 USA
Keywords:	Li2-xMnO3-y thin films; Powder target; RF sputtering; RF power effect; XPS analysis; Electrochemical performance
Department/Centre:	Division of Chemical Sciences > Inorganic & Physical Chemistry Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	20 Apr 2015 07:06
Last Modified:	20 Apr 2015 07:06
URI:	http://eprints.iisc.ac.in/id/eprint/51226

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