Sharma, SK and Mohan, S and Bysakh, S and Kumar, A and Kamat, SV (2013) Nanoscale compositional analysis of NiTi shape memory alloy films deposited by DC magnetron sputtering. In: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, 31 (6). 06F102-1-06F102-7.
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The formation of surface oxide layer as well as compositional changes along the thickness for NiTi shape memory alloy thin films deposited by direct current magnetron sputtering at substrate temperature of 300 degrees C in the as-deposited condition as well as in the postannealed (at 600 degrees C) condition have been thoroughly studied by using secondary ion mass spectroscopy, x-ray photoelectron spectroscopy, and scanning transmission electron microscopy-energy dispersive x-ray spectroscopy techniques. Formation of titanium oxide (predominantly titanium dioxide) layer was observed in both as-deposited and postannealed NiTi films, although the oxide layer was much thinner (8 nm) in as-deposited condition. The depletion of Ti and enrichment of Ni below the oxide layer in postannealed films also resulted in the formation of a graded microstructure consisting of titanium oxide, Ni3Ti, and B2 NiTi. A uniform composition of B2 NiTi was obtained in the postannealed film only below a depth of 200-250 nm from the surface. Postannealed film also exhibited formation of a ternary silicide (NixTiySi) at the film-substrate interface, whereas no silicide was seen in the as-deposited film. The formation of silicide also caused a depletion of Ni in the film in a region similar to 250-300 nm just above the film substrate interface. (C) 2013 American Vacuum Society.
Item Type: | Journal Article |
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Publication: | Journal of Vacuum Science & Technology A Vacuum Surfaces and Films |
Publisher: | American Institute of Physics |
Additional Information: | Copyright of this article belongs to American Institute of Physics |
Department/Centre: | Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering |
Date Deposited: | 26 Dec 2013 05:01 |
Last Modified: | 26 Dec 2013 05:01 |
URI: | http://eprints.iisc.ac.in/id/eprint/48068 |
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