Diffusion in tungsten silicides

Roy, Soumitra and Paul, Aloke (2013) Diffusion in tungsten silicides. In: Intermetallics, 37 . pp. 83-87.

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Abstract

Experiments are conducted in the W-Si system to understand the diffusion mechanism of the species. The activation energies from integrated diffusion coefficients are calculated as 152 +/- 7 and 301 +/- 40 kJ/mol in the WSi2 and W5Si3 phases, respectively. In both the phases, Si has a much higher diffusion rate compared to W. This is not surprising to find in the WSi2 phase, if we consider the number of nearest neighbors for both the elements in the crystal. The diffusion of W in this phase indicates the presence of W antisites. The faster diffusion rate of Si in the W5Si3 phase indicates the presence of higher concentration of vacancies on the Si sublattice compared to W sublattice.

Item Type:	Journal Article
Publication:	Intermetallics
Publisher:	Elsevier Science
Additional Information:	Copyright of this article belongs to Elsevier Science.
Keywords:	Intermetallics; Miscellaneous; Diffusion; Defects: Point Defects
Department/Centre:	Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Date Deposited:	28 May 2013 11:24
Last Modified:	28 May 2013 11:24
URI:	http://eprints.iisc.ac.in/id/eprint/46560

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