Karunanithi, R and Raychaudhuri, AK and Szücs, Z and Shivashankar, GV (1991) Behaviour of power MOSFETs at cryogenic temperatures. In: Cryogenics, 31 (12). pp. 1065-1069.
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Abstract
In this paper an investigation is reported on Siemens-power-metal-oxide-semiconductor (SIPMOS) transistors of both p and n channel types, for their suitability for cryogenic applications. The drain characteristics, temperature dependence of Rds(on) and switching behaviour have been studied in the temperature range 4.2 – 300 K in BSS91 and BSS92 MOSFETs. The experiments reveal that these types of power transistors are well suited for operations down to ≈ 30 K. However, below 30 K the operating characteristics make them unsuitable for application. This arises because of carrier freeze-out in the n− region on the substrate, which forms a drain.
Item Type: | Journal Article |
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Publication: | Cryogenics |
Publisher: | Elsevier science |
Additional Information: | Copyright of this article belongs to Elsevier science. |
Keywords: | Low temperature electronics;MOSFETs;switching. |
Department/Centre: | Division of Physical & Mathematical Sciences > Physics |
Date Deposited: | 11 Nov 2010 06:41 |
Last Modified: | 11 Nov 2010 06:41 |
URI: | http://eprints.iisc.ac.in/id/eprint/33688 |
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