On Uniformity of Film Thickness on Rotating Substrates

Ramprasad, BS and Radha, TS and Rao, Ramakrishna M (1972) On Uniformity of Film Thickness on Rotating Substrates. In: Journal of Vacuum Science and Technology, 9 (4). pp. 1227-1228.

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Abstract

For most applications of thin films, uniformity of film thickness over the substrate area is a necessary requirement. An investigation is being carried out in the laboratory to obtain uniform films on optical components. During the course of investigation, it was observed that reported values of geometrical parameters assumed for minimum variation in film thickness, based on the equation derived by Holland and Steckelmacher,' differ widely. Film thickness distribution curves presented by R4acleod2 are found to be in error. The corrected distribution curves are presented. Also the thickness distribution curves are presented in a form in which suitable geometrical parameters can be chosen readily to yield the desired uniformity in thickness over the area of the substrate.

Item Type:	Journal Article
Publication:	Journal of Vacuum Science and Technology
Publisher:	American Vacuum Society
Additional Information:	Copyright for this article belongs to American Vacuum Society.
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	05 Apr 2005
Last Modified:	19 Sep 2010 04:18
URI:	http://eprints.iisc.ac.in/id/eprint/2740

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