Growth and characterization of $SrBi_{2}Nb_{2}O_{9}$ thin films by pulsed-laser ablation

Bhattacharyya, S and Bharadwaja, SSN and Krupanidhi, SB (1999) Growth and characterization of $SrBi_{2}Nb_{2}O_{9}$ thin films by pulsed-laser ablation. In: Applied Physics Letters, 75 (17). pp. 2656-2658.

PDF GetPDFServlet.pdf - Published Version Restricted to Registered users only Download (53kB) | Request a copy

Abstract

Polycrystalline films of SrBi2Nb2O9 were grown using pulsed-laser ablation. The ferroelectric properties were achieved by low-temperature deposition followed by a subsequent annealing process. The lower switching voltage was obtained by lowering the thickness, which did not affect the insulating nature of the films. The hysteresis results showed an excellent square-shaped loop with results (P-r=6 mu C/cm(2), E-c=100 kV/cm) in good agreement with earlier reports. The films also exhibited a dielectric constant of 250 and a dissipation factor of 0.02. The transport studies indicated an ohmic behavior, while higher voltages induced a bulk space charge.

Item Type:	Journal Article
Publication:	Applied Physics Letters
Publisher:	American Institute of Physics
Additional Information:	Copyright of this article belongs to American Institute of Physics.
Department/Centre:	Division of Chemical Sciences > Materials Research Centre
Date Deposited:	23 Jul 2009 07:17
Last Modified:	19 Sep 2010 05:29
URI:	http://eprints.iisc.ac.in/id/eprint/19593

Actions (login required)

View Item