Mere, V and Kallega, R and Selvaraja, S K (2019) Amorphous Germanium for Mid Infrared Photonics. In: Workshop on Recent Advances in Photonics, WRAP 2019 December, 13 December 2019 through 14 December 2019, Guwahati; India..
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Official URL: https://dx.doi.org/10.1109/WRAP47485.2019.9013804
Abstract
We present a low-temperature plasma-enhanced-chemical-vapor-deposition of amorphous germanium films for Mid-infrared photonics. A film transparency of 3.2 to 8 μm with a minimum average roughness of 0.26 nm is achieved by tuning the deposition parameters. © 2019 IEEE.
Item Type: | Conference Paper |
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Publication: | 2019 Workshop on Recent Advances in Photonics, WRAP 2019 |
Publisher: | IEEE |
Additional Information: | cited By 0; Conference of 2019 Workshop on Recent Advances in Photonics, WRAP 2019 ; Conference Date: 13 December 2019 Through 14 December 2019; Conference Code:158197 |
Keywords: | Germanium; Infrared devices; Plasma CVD; Plasma enhanced chemical vapor deposition; Silicon photonics; Temperature, Amorphous germanium; Deposition Parameters; Film transparency; Germanium on silicons; Low temperature plasmas; Midinfrared, Optical waveguides |
Department/Centre: | Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering |
Date Deposited: | 31 Aug 2020 10:57 |
Last Modified: | 31 Aug 2020 10:57 |
URI: | http://eprints.iisc.ac.in/id/eprint/65089 |
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