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Kondaiah, P and Jagadish Chandra, SV and Fortunato, E and Chel Jong, C and Mohan Rao, G and Koti Reddy, DVR and Uthanna, S (2020) Substrate temperature influenced ZrO2 films for MOS devices. In: Surface and Interface Analysis, 52 (9). pp. 541-546.
Reddy, Nanda Kumar N and Akkera, Harish Sharma and Sekhar, Chandra M and Uthanna, S (2019) Influence of Ta2O5 Interfacial Oxide Layer Thickness on Electronic Parameters of Al/Ta2O5/p-Si/Al Heterostructure. In: SILICON, 11 (1). pp. 159-164.
Sekhar, M. Chandra and Reddy, Nanda Kumar and Reddy, Purusottam and Prakash, B Poorna and Akkera, Harish Sharma and Uthanna, S and Park, Si-Hyun (2018) Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta2O5)(0.85)(TiO2)(0.15)/p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering. In: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 76 . pp. 80-86.
Kondaiah, P and Madhavi, V and Sekhar, Chandra M and Rao, Mohan G and Uthanna, S (2015) Growth of TiO2 Films by RF Magnetron Sputtering for MOS Gate Dielectrics: Influence of Substrate Temperature. In: SCIENCE OF ADVANCED MATERIALS, 7 (8). pp. 1640-1648.
Sekhar, Chandra M and Reddy, Nanda Kumar N and Rao, Venkata B and Rao, Mohan G and Uthanna, S (2014) Influence of sputter power on structural and electrical properties of TiO2 films for Al/TiO2/Si gate capacitors. In: SURFACE AND INTERFACE ANALYSIS, 46 (7). pp. 465-471.
Kondaiah, P and Madhavi, V and Sekhar, Chandra M and Rao, Mohan G and Uthanna, S (2013) Structural, electrical and dielectric properties of sputtered TiO2 films for Al/TiO2/Si capacitors. In: Science of Advanced Materials, 5 (4). pp. 398-405.
Sekhar, Chandra M and Kondaiah, P and Rao, Mohan G and Chandra, Jagadeesh SV and Uthanna, S (2013) Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors. In: SUPERLATTICES AND MICROSTRUCTURES, 62 . pp. 68-80.
Sekhar, Chandra M and Kondaiah, P and Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2012) Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric. In: SURFACE AND INTERFACE ANALYSIS, 44 (9). pp. 1299-1304.
Sekhar, Chandra M and Kondaiah, P and Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2011) Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO(2) thin films by DC magnetron sputtering. In: Applied Surface Science, 258 (5). pp. 1789-1796.
Chandra, Jagadeesh SV and Choi, Chel-Jong and Uthanna, S and Rao, Mohan G (2010) Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing. In: Materials Science in Semiconductor Processing, 13 (4). pp. 245-251.
Nirupama, V and Gunasekhar, KR and Sreedhar, B and Uthanna, S (2010) Effect of oxygen partial pressure on the structural and optical properties of dc reactive magnetron sputtered molybdenum oxide films. In: Current Applied Physics, 10 (1). pp. 272-278.
Reddy, A Sivasankar and Park, Hyung-Ho and Rao, G Mohan and Uthanna, S and Reddy, P Sreedhara (2009) Effect of substrate temperature on the physical properties of dc magnetron sputtered CuAlO2 films. In: Journal of Alloys and Compounds, 474 (1-2). pp. 401-405.
Chandra, Jagadeesh SV and Chandrasekhar, M and Rao, Mohan G and Uthanna, S (2009) Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films. In: Journal of Materials Science: Materials in Electronics, 20 (4). pp. 295-300.
Chandra, Jagadeesh SV and Uthanna, S and Rao, Mohan G (2008) Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films. In: Applied Surface Science, 254 (7). pp. 1953-1960.
Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2007) Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films. In: Crystal Research and Technology, 42 (3). pp. 290-294.
Uthanna, S and Subramanyam, TK and Naidu, B Srinivasulu and Rao, G Mohan (2002) Structure-composition-property dependence in reactive magnetron sputtered ZnO thin films. In: Optical Materials, 19 (4). pp. 461-469.
Sujatha, Ch and Rao, Mohan G and Uthanna, S (2002) Characteristics of indium tin oxide films deposited by bias magnetron sputtering. In: Materials Science and Engineering B, 94 (1). pp. 106-110.
Subramanyam, TK and Rao, Mohan G and Uthanna, S (2001) Process parameter dependent property studies on CdO films prepared by DC reactive magnetron sputtering. In: Materials Chemistry and Physics, 69 (1-3). pp. 133-142.
