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Chopade, SS and Nayak, C. and Bhattacharyya, D and Jha, SN and Tokas, RB and Sahoo, NK and Deo, MN and Biswas, A and Rai, Sanjay and Raman, Thulasi KH and Rao, GM and Kumar, Niranjan and Patil, DS (2015) RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization. In: APPLIED SURFACE SCIENCE, 355 . pp. 82-92.
Raman, Thulasi KH and Penki, Tirupathi Rao and Munichandraiah, N and Rao, Mohan G (2014) Titanium nitride thin film anode: chemical and microstructural evaluation during electrochemical studies. In: ELECTROCHIMICA ACTA, 125 . pp. 282-287.
Shaik, Habibuddin and Raman, Thulasi KH and Rao, Mohan G (2012) Influence of Si-C bond density on the properties of a-Si(1-x)C(x) thin films. In: Applied Surface Science, 258 (7). pp. 2989-2996.
Raman, Thulasi KH and Kiran, MSRN and Ramamurty, U and Rao, Mohan G (2012) Structural and mechanical properties of room temperature sputter deposited CrN coatings. In: MATERIALS RESEARCH BULLETIN, 47 (12). pp. 4463-4466.
