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Chopade, SS and Barve, SA and Raman, KH Thulasi and Chand, N and Deo, MN and Biswas, A and Rai, Sanjay and Lodha, GS and Rao, GM and Patil, DS (2013) RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition. In: APPLIED SURFACE SCIENCE, 285 (B). pp. 524-531.
