Number of items: 2.
Chopade, SS and Nayak, C. and Bhattacharyya, D and Jha, SN and Tokas, RB and Sahoo, NK and Deo, MN and Biswas, A and Rai, Sanjay and Raman, Thulasi KH and Rao, GM and Kumar, Niranjan and Patil, DS
(2015)
RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization.
In: APPLIED SURFACE SCIENCE, 355
.
pp. 82-92.
Chopade, SS and Barve, SA and Raman, KH Thulasi and Chand, N and Deo, MN and Biswas, A and Rai, Sanjay and Lodha, GS and Rao, GM and Patil, DS
(2013)
RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition.
In: APPLIED SURFACE SCIENCE, 285
(B).
pp. 524-531.
This list was generated on Fri Apr 19 10:58:27 2024 IST.
