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Sekhar, Chandra M and Kondaiah, P and Rao, Mohan G and Chandra, Jagadeesh SV and Uthanna, S (2013) Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors. In: SUPERLATTICES AND MICROSTRUCTURES, 62 . pp. 68-80.
Sekhar, Chandra M and Kondaiah, P and Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2012) Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric. In: SURFACE AND INTERFACE ANALYSIS, 44 (9). pp. 1299-1304.
Sekhar, Chandra M and Kondaiah, P and Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2011) Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO(2) thin films by DC magnetron sputtering. In: Applied Surface Science, 258 (5). pp. 1789-1796.
Chandra, Jagadeesh SV and Choi, Chel-Jong and Uthanna, S and Rao, Mohan G (2010) Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing. In: Materials Science in Semiconductor Processing, 13 (4). pp. 245-251.
Chandra, Jagadeesh SV and Chandrasekhar, M and Rao, Mohan G and Uthanna, S (2009) Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films. In: Journal of Materials Science: Materials in Electronics, 20 (4). pp. 295-300.
Chandra, Jagadeesh SV and Uthanna, S and Rao, Mohan G (2008) Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films. In: Applied Surface Science, 254 (7). pp. 1953-1960.
Chandra, Jagadeesh SV and Rao, Mohan G and Uthanna, S (2007) Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films. In: Crystal Research and Technology, 42 (3). pp. 290-294.
