Up a level |
Bujjamma, J and Ganapathi, KL and Mohan, S (2009) Ion Assisted Deposition of HfO2 thin films for CMOS gate dielectric applications. In: Oral presentation in ICMAT-2009.
Babu, Satheesh G and Jitin, MA and Bujjamma, J and Mohan, S (2008) Electrical and Optical Properties of CeO2 Thin Films for High-K Applications. In: Proceedings of ISSS, International Conference on Smart Materials Structures and Systems Bangalore, India.