Wide beam ion optics of mass analyser for ion implanters

Muralidhar, GK and Mohan, S and Menon, AG and Krishnarajulu, B (1992) Wide beam ion optics of mass analyser for ion implanters. In: Vacuum, 43 (4). pp. 293-295.

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Abstract

This paper presents design parameters of mass analysis magnets used for achieving second-order double focusing in ion implanters fitted with a wide beam ion source. A sector magnet with curved pole faces has been considered in the present computations. The results of our study have highlighted the significance of the parameters $\phi$, magnet deflection angle, $\alpha$ and $\beta$, the beam entrance and exit angles, R, radius of the ion trajectory, and S, the slit width of the ion source, in the design of these magnet systems.

Item Type:	Journal Article
Publication:	Vacuum
Publisher:	Elsevier
Additional Information:	Copyright of this article belongs to Elsevier.
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	16 Oct 2006
Last Modified:	19 Sep 2010 04:32
URI:	http://eprints.iisc.ac.in/id/eprint/8866

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