Influence of substrate temperature on the properties of argon-ion-assisted-deposited $CeO_2$ films

AI-Robaee, Mansour S and Shivalingappa, L and Rao, Narasimha K and Mohan, S (1992) Influence of substrate temperature on the properties of argon-ion-assisted-deposited $CeO_2$ films. In: Thin Solid Films, 221 (1-2). pp. 214-219.

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Abstract

The effects of argon ion bombardment and substrate temperature on the optical and structural properties of electron-beam-evaporated $CeO_2$ films have been investigated. The refractive index, extinction coefficient, packing density, inhomogeneity and structure are reported for ion energies in the range 300-700 eV, and ion current densities in the range 50-220 $\mu A cm ^{-2}$. The substrate temperature was varied between ambient and 300 °C. Argon ion bombardment of $CeO_2$ films deposited at ambient temperature has significantly influenced the extinction coefficient of the films. The combined effect of elevated substrate temperature, ion energy and ion current density resulted in a decrease in the extinction coefficient. The maximum refractive index (n = 2.45 at $\lambda$ = 550 nm), nearly unity packing density and absorption-free films have been obtained for a rate of deposition of 0.3 nm $sec ^{-1}$, an ion energy of 600 eV, an ion density of 220 $\mu A cm ^{-2}$ and a substrate temperature of 300 °C. Argon ion bombardment and an elevated substrate temperature resulted in an orientation change from (111) to (220).

Item Type:	Journal Article
Publication:	Thin Solid Films
Publisher:	Elsevier Science
Additional Information:	Copyright of this article belongs to Elsevier Science.
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	15 Nov 2006
Last Modified:	22 Feb 2012 06:08
URI:	http://eprints.iisc.ac.in/id/eprint/8854

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