Vaidyula, KK and Dhar, S and Lalithambika, A and Shivashankar, SA (2024) Thermodynamic Modeling of Carbonaceous Coating of Oxides and Sulfides Thin Films Grown by CVD for Enhancing Surface Quality. [Book Chapter]
Full text not available from this repository. (Request a copy)Abstract
Over the years, to achieve high quality large-area thin films, chemical vapor deposition (CVD) technique is used. However, achieving high quality is a challenge due to controllability of process parameters like carrier and precursor gas flows, reactor pressure, sublimation temperature and reactor temperature. To solve this problem, a generic approach involving thermodynamic modelling is used. In this work, using thermodynamic modelling an appropriate CVD process window is attained. Firstly, thermodynamic analysis of the solid and gas phases for the Al-C-O-H-Ar system to grow alumina in an CVD chamber predicts large amount of carbon in Ar ambient. As oxygen is introduced as the reacting gas, carbon content in the film reduces by significant extent. X-ray diffraction and Raman spectroscopy used to characterise the carbon less films. Secondly, a detailed thermodynamic modelling of MoS2 in argon and hydrogen ambient is presented. Raman Spectroscopy and X-ray diffraction are used to characterize the films grown. Using the model, at 700°C and higher pressures in hydrogen ambient, pure MoS2 is grown. © 2024 Scrivener Publishing LLC.
| Item Type: | Book Chapter |
|---|---|
| Publication: | Novel Anti-Corrosion and Anti-Fouling Coatings and Thin Films |
| Publisher: | wiley |
| Additional Information: | The copyright for this article belongs to the publishers. |
| Department/Centre: | Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering |
| Date Deposited: | 06 Dec 2024 18:01 |
| Last Modified: | 06 Dec 2024 18:01 |
| URI: | http://eprints.iisc.ac.in/id/eprint/86927 |
Actions (login required)
 |
View Item |
