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Antiferroelectric oxide thin-films: Fundamentals, properties, and applications

Si, Y and Zhang, T and Liu, C and Das, S and Xu, B and Burkovsky, RG and Wei, X-K and Chen, Z (2024) Antiferroelectric oxide thin-films: Fundamentals, properties, and applications. In: Progress in Materials Science, 142 .

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Official URL: https://doi.org/10.1016/j.pmatsci.2023.101231

Abstract

Antiferroelectrics have received blooming interests because of a wide range of potential applications in energy storage, solid-state cooling, thermal switch, transducer, actuation, and memory devices. Many of those applications are the most prospective in thin film form. The antiferroelectric ordering in thin films is highly sensitive to a rich set of factors, such as lattice strain, film thickness, surface and interface effects as well as film stoichiometry. To unlock the full potential of these materials and design high-quality thin films for functional devices, a comprehensive and systematic understanding of their behavior is essential. In conjunction with the necessary fundamental background of antiferroelectrics, we review recent progress on various antiferroelectric oxide thin films, the key parameters that trigger their phase transition and the device applications that rely on the robust responses to electric, thermal, and optical stimuli. Current challenges and future perspectives highlight new and emerging research directions in this field. We hope this review can boost the development of antiferroelectric thin-film materials and device design, stimulating more researchers to explore the unknowns together. © 2023 Elsevier Ltd

Item Type: Journal Article
Publication: Progress in Materials Science
Publisher: Elsevier Ltd
Additional Information: The copyright for this article belongs to Elsevier Ltd.
Keywords: Antiferroelectricity; Ferroelectric materials; Ferroelectricity; Oxide films, Anti ferroelectrics; Double hysteresis loop; Fundamental properties; Oxide thin films; Solid-state cooling; Thermal actuation; Thermal memory; Thermal switch; Thin film and heterostructure; Thin-films, Thin films
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 04 Mar 2024 06:05
Last Modified: 04 Mar 2024 06:05
URI: https://eprints.iisc.ac.in/id/eprint/84139

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