ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Mechanism for downward trimming of polymer resistors

Narayana, Badri T and Ramkumar, K and Satyam, M (1992) Mechanism for downward trimming of polymer resistors. In: Journal of Physics D: Applied Physics, 25 (4). pp. 717-721.

[img] PDF
Restricted to Registered users only

Download (407kB) | Request a copy


The effect of infrared radiation on the resistivity of polymer-based thick film resistors was studied. it was found that the resistivity decreases with both the density and duration of the infrared and with the number of exposures. The change in resistivity was attributed to the viscous flow of the polymer at the temperature attained by the film when exposed to infrared radiation. A model has been proposed through which the percentage change in resistance can be estimated in terms of the number of exposures, duration of exposures etc. Based on these studies it was possible to suggest a downward trimming method for polymer film resistors in which the polymer film is exposed to intermittant infrared radiation pulses of the duration of the order of a few seconds. This method of trimming appears to be a clean process, with the resistors being free from hot spots.

Item Type: Journal Article
Publication: Journal of Physics D: Applied Physics
Publisher: Institute of Physics
Additional Information: Copyright of this article belongs to Institute of Physics.
Department/Centre: Division of Electrical Sciences > Electrical Communication Engineering
Date Deposited: 16 Aug 2006
Last Modified: 19 Sep 2010 04:30
URI: http://eprints.iisc.ac.in/id/eprint/8027

Actions (login required)

View Item View Item