Karmel Kranthi, N and Salman, A and Boselli, G and Shrivastava, M (2019) Current Filament Dynamics under ESD Stress in High Voltage (Bidirectional) SCRs and It's Implications on Power Law Behavior. In: 2019 IEEE International Reliability Physics Symposium, IRPS 2019, 31 March 2019 - 4 April 2019, Monterey.
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Abstract
Physical Insights into the early formation of current filaments in High Voltage SCR is presented. Repeated current filamentation and subsequent filament spreading, which in turn results in filament motion, is detected using 3D TCAD. Impact of different load lines on ESD robustness and filament dynamics with ESD stress duration has been studied using experiments and 3D TCAD simulations. Finally, impact of silicide blocking in mitigating filament strength has been studied, which in turn improves the ESD robustness.
Item Type: | Conference Paper |
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Publication: | IEEE International Reliability Physics Symposium Proceedings |
Publisher: | Institute of Electrical and Electronics Engineers Inc. |
Additional Information: | The copyright for this article belongs to Institute of Electrical and Electronics Engineers Inc. |
Keywords: | Electronic design automation; Electrostatic discharge; Silicides, Current filamentation; Current filaments; ESD robustness; Filament dynamics; High voltage; Laterally Double Diffused MOS (LDMOS); Power-law behavior; TCAD simulation, Electrostatic devices |
Department/Centre: | Division of Electrical Sciences > Electronic Systems Engineering (Formerly Centre for Electronic Design & Technology) |
Date Deposited: | 27 Dec 2022 04:57 |
Last Modified: | 27 Dec 2022 04:57 |
URI: | https://eprints.iisc.ac.in/id/eprint/78565 |
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