Mere, V and Selvaraja, SK (2019) Demonstration of alignment error-free pattering of tapered waveguide using fixed beam moving stage e-beam lithography. In: Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII 2019, 3 - 5 February 2019, San Francisco.
Full text not available from this repository.Abstract
We present a method to write a tapered waveguide using fixed-beam-moving-stage (FBMS) in an electron-beam lithography system. FBMS allows writing of large patterns without stitch-error, however, restricts only a few primitive shapes. For patterning tapers, a combination of FMBS with area-mode is used that typically results in alignment errors. The proposed method offers smooth and alignment-error-free tapering of sub-micron featured Silicon waveguide. We experimentally demonstrate a fully FBMS patterned photonic circuit with power splitter, wire-to-slot coupler, slot waveguide and a slotted ring resonator. The device response with insertion loss -1.35dB is measured using a tunable laser source around 1550 nm wavelength.
| Item Type: | Conference Paper |
|---|---|
| Publication: | Proceedings of SPIE - The International Society for Optical Engineering |
| Publisher: | SPIE |
| Additional Information: | The copyright for this article belongs to SPIE. |
| Keywords: | Alignment; Electron beam lithography; Electron beams; Errors; Optical waveguides; Waveguides, Device response; e-Beam lithography; FBMS; Photonic circuits; Power splitters; Silicon waveguide; Tapered waveguide; Tunable laser sources, Silicon photonics |
| Department/Centre: | Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering |
| Date Deposited: | 23 Nov 2022 05:21 |
| Last Modified: | 23 Nov 2022 05:21 |
| URI: | https://eprints.iisc.ac.in/id/eprint/77933 |
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