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Characteristics of indium tin oxide films deposited by bias magnetron sputtering

Sujatha, Ch and Rao, Mohan G and Uthanna, S (2002) Characteristics of indium tin oxide films deposited by bias magnetron sputtering. In: Materials Science and Engineering B, 94 (1). pp. 106-110.

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Indium tin oxide coatings have been deposited on glass substrates with substrate bias as a process parameter along with substrate temperature. It was found that films deposited with substrate heating and/or substrate bias were polycrystalline in nature and predominantly (400) oriented. The results are correlated to microstructural variation due to the process parameters. Films with lowest sheet resistance, 7.6 ohm/sq and electron concentration of $8.1 \times10^{21}\hspace{2mm}cm^{-3}$ have been achieved in case of films deposited at $370^o\hspace{2mm}C$ with a substrate bias of + 18 V

Item Type: Journal Article
Publication: Materials Science and Engineering B
Publisher: Elsevier
Additional Information: Copyright of this article belongs to Elsevier.
Keywords: Transparent conductors;Bias sputtering;Indium tin oxide
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited: 02 Jun 2006
Last Modified: 19 Sep 2010 04:28
URI: http://eprints.iisc.ac.in/id/eprint/7370

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