ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Impact of microstructure on dielectric properties of $Pb(Mg_{1/3}Nb_{2/3})O_3 - PbTiO_3$ thin films

Laha, Apurba and Bhattacharyya, S and Krupanidhi, SB (2004) Impact of microstructure on dielectric properties of $Pb(Mg_{1/3}Nb_{2/3})O_3 - PbTiO_3$ thin films. In: Materials Science and Engineering B, 106 (2). pp. 111-119.

[img] PDF
Restricted to Registered users only

Download (546kB) | Request a copy


Relaxor thin films of $Pb(Mg_{1/3}Nb_{2/3})O_3 - PbTiO_3$ (PMN–PT) with different microstructures have been grown on platinum-coated silicon substrate using pulsed excimer laser ablation technique. The microstructure of the thin filmswas found to be strongly influenced by the substrate temperature and the substrate microstructure. An intermediate layer of $La_{0.5}Sr_{0.5}CoO_3$ (LSCO) was deposited on the platinum-coated silicon substrate prior to the deposition of the (PMN–PT) thin films.We found that the both the microstructure and perovskite phase in the PMN–PT thin films could be controlled by monitoring the substrate temperature along with the microstructure of the template layer. The dielectric properties of the films with different microstructure were studied as a function frequency over a wide range of temperatures. A direct impact of the microstructure on relaxor properties has been observed in the present case.

Item Type: Journal Article
Publication: Materials Science and Engineering B
Publisher: Elsevier
Additional Information: The copyright belongs to Elsevier.
Keywords: PMN–PT thin films;Laser ablation;Microstructure;Dielectric properties
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 01 Jun 2006
Last Modified: 19 Sep 2010 04:28
URI: http://eprints.iisc.ac.in/id/eprint/7257

Actions (login required)

View Item View Item