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Thermal Stability of Perfluoroalkyl Silane Self-Assembled on a Polycrystalline Aluminum Surface

Devaprakasam, D and Sampath, S and Biswas, SK (2004) Thermal Stability of Perfluoroalkyl Silane Self-Assembled on a Polycrystalline Aluminum Surface. In: Langmuir, 20 (4). pp. 1329-1334.

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Thermal stability behavior of 1H,1H,2H,2H-perfluorooctyl trichlorosilane self-assembled on aluminum substrates is characterized using a grazing-angle Fourier transform infrared spectrometer, Fourier transform-Raman spectroscopy, and contact angle measurements. The self-assembled monolayer (SAM) is heated quasi-statically from room temperature to above 633 K with a heating rate of 1 K/s. Variations in peak frequencies, integrated areas of intensities of symmetric and antisymmetric $CF_2$ stretches, and the relative tilt angle of the SAM are reported. We find that the conformational order in the SAM is not disrupted because of thermal cyclingwhenthe peak temperature is below 423 K.Whenthe peak temperature is between 423 and 603 K, the cycling results in only a partial retention of the original order. When the peak temperature is above 603 K, the process is completely irreversible. Surface-enhanced Raman spectroscopy and contact angle measurements support these observations. We confirm these trends for a longer chain (1H,1H,2H,2H-perfluordecyl trichlorosilane) molecule of the same family using the same techniques.Wediscuss the possible reasons for the changes in light of the tilting-untilting and uncoilingcoiling of the helical silane monolayer.

Item Type: Journal Article
Publication: Langmuir
Publisher: American Chemical Society
Additional Information: The copyright belongs to American Chemical Society.
Department/Centre: Division of Mechanical Sciences > Mechanical Engineering
Division of Chemical Sciences > Inorganic & Physical Chemistry
Date Deposited: 31 May 2006
Last Modified: 19 Sep 2010 04:27
URI: http://eprints.iisc.ac.in/id/eprint/7146

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