A Simple Method for Fabrication of Self-sharpened Silicon Tips for Atomic Force Microscopy Applications

Bagur Rudrappa, D and Bhat Venkatramana, V and Ahmed, S and Sharma, A and Purakkat, S and Yeriyur Basavaiah, B (2022) A Simple Method for Fabrication of Self-sharpened Silicon Tips for Atomic Force Microscopy Applications. In: Crystal Research and Technology .

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Abstract

A simple and high yield method is presented for the bulk generation of atomic force microscopy (AFM) probes with self-sharpened silicon tips. The experimental setup includes a controlled chemical etching environment at a constant temperature with continuous recirculation and filtration. A KOH solution is considered cost-effective as the etchant and stabilized to the required concentration (55, v/v) and temperature (40 °C), so as to provide an etch rate of 40 nm min�1 and yield a smooth etch profile. A high density of silicon tips is fabricated, with yield up to 90, and a consistent tip radius of �12.73 ± 1.51 nm. These tips can be successfully integrated with AFM cantilevers, resulting in AFM probes. Further, such AFM-probes are well characterized using laser Doppler vibrometry and scanning electron microscopy. The result shows a resonance frequency of 1.2�1.4 MHz and a high-quality factor of �708.8. In addition, the AFM probes produced images are comparable in quality to those obtained from commercially available probes. © 2022 Wiley-VCH GmbH

Item Type:	Journal Article
Publication:	Crystal Research and Technology
Publisher:	John Wiley and Sons Inc
Additional Information:	The copyright for this article belongs to John Wiley and Sons Inc
Keywords:	Cost effectiveness; Etching; Fabrication; Laser Doppler velocimeters; Potassium hydroxide; Probes; Scanning electron microscopy; Silicon, Atomic-force-microscopy; Constant temperature; Controlled chemical etchings; Cost effective; Higher yield; KOH solution; Recirculations; Silicon tips; SIMPLE method; Simple++, Atomic force microscopy
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	07 Feb 2022 12:11
Last Modified:	07 Feb 2022 12:11
URI:	http://eprints.iisc.ac.in/id/eprint/71241

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