Development of titanium nitride thin film microheaters using laser micromachining

Jithin, MA and Ganapathi, KL and Ambresh, M and Nukala, P and Udayashankar, NK and Mohan, S (2022) Development of titanium nitride thin film microheaters using laser micromachining. In: Vacuum, 197 .

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Abstract

In this paper, we report the fabrication and characterization of titanium nitride (TiN) thin-film-based microheaters. TiN thin films have been optimized on Si and SiO2 substrates for their optimum electrical resistivities by controlling the process parameters, including argon:nitrogen (Ar:N2) ratio in reactive pulsed DC magnetron sputter (PDCMS) deposition technique. An optical emission spectroscope (OES) was used for monitoring the plasma characteristics at various nitrogen flow rates. The microstructural and surface properties of the TiN films have been investigated and correlated with the electrical properties. It has been observed that the amount of nitrogen flux in the TiN plasma plays an essential role in the microstructural, surface, and electrical properties of the TiN thin films. Micro-heaters have been fabricated with TiN thin films with low electrical resistivity using laser engraving techniques instead of conventional lithographic and micromachining techniques. The TiN microheater has shown excellent performance. A temperature of 406 °C has been achieved by applying an input power of 8 W. This work paves the path for developing scalable and economic TiN microheaters using laser micromachining techniques. © 2021

Item Type:	Journal Article
Publication:	Vacuum
Publisher:	Elsevier Ltd
Additional Information:	The copyright for this article belongs to Elsevier Ltd
Keywords:	Electric conductivity; Heating equipment; Magnetron sputtering; Metallic films; Micromachining; Nitrogen plasma; Plasma CVD; Pulsed lasers; Silica; Silicon; Thin films; Titanium nitride, Fabrication and characterizations; Laser engraving; Laser micro-machining; Laser-micromachining; Micro-structural; Microheater; Micromachining techniques; Pulsed DC magnetron sputtering; Reactive pulsed DC magnetra sputtering; Titanium nitride thin films, Nitrogen
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	07 Jan 2022 07:00
Last Modified:	07 Jan 2022 07:00
URI:	http://eprints.iisc.ac.in/id/eprint/70911

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