Experimental realization of sub-micron patterning using counter-propagating interfering lightsheets (iCLASS)

Mohan, K and Mondal, PP (2020) Experimental realization of sub-micron patterning using counter-propagating interfering lightsheets (iCLASS). In: OSA Continuum, 3 (3). pp. 668-675.

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Abstract

A light-sheet-based plane-selective sub-micron patterning technique is proposed to fabricate 1D sub-micron patterns with specificity and selectivity. The proposed technique is termed as, interfering coherent light-sheet assisted structure synthesis (iCLASS). The technique uses specialized 2� optical illumination geometry to expose the photoresist film. Counter-propagating light sheets (satisfying phase-matching condition) produce 1D interference pattern with feature size below the diffraction limit. A conventional S1813 photoresist coated on a cleaned glass substrate is exposed to the light-sheets pattern and subsequently, the photoresist film is developed to imprint the sub-micron pattern. AFM study confirms imprinted 1D pattern with a periodicity and feature-size of approximately, λ/2. Analysis show that the light-dose interaction-time (�exp, �dev) plays crucial role in determining the periodicity of 1D sub-micron pattern. © 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

Item Type:	Journal Article
Publication:	OSA Continuum
Publisher:	The Optical Society
Additional Information:	The copyright for this article belongs to The Optical Society
Keywords:	Diffraction; Phase matching; Substrates, Cleaned glass substrates; Diffraction limits; Experimental realizations; Interference patterns; Optical illumination; Patterning techniques; Phase matching conditions; Structure synthesis, Photoresists
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	26 Jul 2021 09:15
Last Modified:	26 Jul 2021 09:15
URI:	http://eprints.iisc.ac.in/id/eprint/68982

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