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Direct laser writing on silicon surface for large area nanoplasmonic devices

Sharma, A and Bhargav, G and Kaushal, A and Bhat, KN and Ghosh, A (2021) Direct laser writing on silicon surface for large area nanoplasmonic devices. In: Novel Patterning Technologies 2021, 22-26 Feb 2021.

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Official URL: https://doi.org/10.1117/12.2583823


The present work use direct laser writing (DLW) system for fabrication of large area patterning of microstructures. Micro sized square pattern of 1μm size with 2μm spacing were successfully fabricated on 1500 x 1500 μm2 large area Si substrate. The developed microstructures found potential application in colloidal nanotweezers manipulation of plasmonic devices. The results shows precision in large scale micro patterning using DLW system and claimed a faster and simple process in patterning microstructure compared to electron beam (e-beam) lithography process. The developed micro patterning are dry etched using RIE to convert SiO2 pillar of 500 nm height with tip diameter of 250 nm to fabricate the helical structures which found potential applications in nanoplasmonic devices. © 2021 SPIE.

Item Type: Conference Paper
Publication: Proceedings of SPIE - The International Society for Optical Engineering
Publisher: SPIE
Additional Information: The copyright for this article belongs to The Society of Photo-Optical Instrumentation Engineers (SPIE)
Keywords: Microstructure; Plasmonics; Silica; Silicon; Silicon oxides, Direct laser writing; Helical structures; Large-area patterning; Lithography process; Micro patterning; Plasmonic devices; Silicon surfaces; Square patterns, Lithography
Department/Centre: Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 04 Aug 2021 06:51
Last Modified: 04 Aug 2021 06:51
URI: http://eprints.iisc.ac.in/id/eprint/68971

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