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Carbon nitride for photovoltaic applications

Murahari, P and Fernandes, BJ and Deva Arun Kumar, K and Simon, RF and Ramesh, K (2020) Carbon nitride for photovoltaic applications. In: AIP Conference Proceedings, 18 December 2019 through 22 December 2019, Indian Institute of Technology, Rajasthan; India.

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Official URL: https://dx.doi.org/10.1063/5.0016717


The properties of carbon nitride films prepared using chemical vapour deposition (CVD) method is described in this manuscript. The vapour of an organic molecule 2,4,6-Tris(dimethylamino)-1,3,5-triazine (C9H18N6) pyrolysed at 800 oC deposited on quartz substrates (SiO2) have been investigated. The characterisation of films by different techniques such as XRD, Raman, SEM, FTIR and XPS confirm the amorphous nature of the prepared films. The optical characterisation results of films obtained by the diffuse reflectance spectroscopy (DRS) demonstrate that the amorphous carbon nitride films could have potential applications as photovoltaic materials. © 2020 American Institute of Physics Inc.. All rights reserved.

Item Type: Conference Paper
Publication: AIP Conference Proceedings
Publisher: American Institute of Physics Inc.
Additional Information: cited By 0; Conference of 64th DAE Solid State Physics Symposium 2019, DAE-SSPS 2019 ; Conference Date: 18 December 2019 Through 22 December 2019; Conference Code:164824
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Date Deposited: 18 Jan 2021 05:51
Last Modified: 18 Jan 2021 05:51
URI: http://eprints.iisc.ac.in/id/eprint/67185

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