Structural and Electrochemical Characterization of Nanostructured Titanium Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge

Kavitha, A and Gunasekhar, K R and Balakrishnan, T (2019) Structural and Electrochemical Characterization of Nanostructured Titanium Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge. In: IRANIAN JOURNAL OF SCIENCE AND TECHNOLOGY TRANSACTION A-SCIENCE, 43 (A5). pp. 2665-2671.

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Abstract

In this study, nanostructured titanium (Ti) thin films were prepared by direct current magnetron sputtering (diode mode) and supported discharge (triode mode) on a stainless steel substrate. The X-ray diffraction pattern shows a preferred orientation (002) plane and exhibits a hexagonal cubic structure for the film prepared at a lower working pressure (0.7 Pa). The electrical resistivity was found to be 15 mu ohm-cm. The scanning electron microscopy analysis indicates that the coatings in triode mode have agglomerates with larger grains compared to the DC magnetron sputtering diode mode. The surface topography was examined by atomic force microscopy. The electrochemical studies of the Ti thin films coated at a lower working pressure (0.7 Pa) provide evidence for better corrosion resistance.

Item Type:	Journal Article
Publication:	IRANIAN JOURNAL OF SCIENCE AND TECHNOLOGY TRANSACTION A-SCIENCE
Publisher:	SPRINGER INTERNATIONAL PUBLISHING AG
Additional Information:	copyright for this article belongs to SPRINGER INTERNATIONAL PUBLISHING AG
Keywords:	Ti thin films; Supported discharge; triode; Electrical properties; Corrosion resistance
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	23 Oct 2019 10:33
Last Modified:	23 Oct 2019 10:33
URI:	http://eprints.iisc.ac.in/id/eprint/63759

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