All inorganic solution processed three terminal charge trapping memory device

Mondal, Sandip and Venkataraman, V (2019) All inorganic solution processed three terminal charge trapping memory device. In: APPLIED PHYSICS LETTERS, 114 (17).

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Abstract

We demonstrate charge trapping memory devices comprising aluminum oxide phosphate (ALPO) blocking/indium gallium zinc oxide charge-trapping/ALPO tunneling layers with a bottom-gated architecture fabricated by sol-gel process technique at temperatures as low as 300 degrees C. The memory device offers a large memory hysteresis of 13.5 V in the I-d-V-g curve when the gate voltage is swept from -20 to +30 V and back. The true program-erase (P/E) window of 7 V is established for the P/E square pulse of +/- 20 V s(-1). Good retention characteristic is confirmed within the experimental limit of 10(4) s. The P/E mechanism is illustrated by the complete band structure of the memory devices. We also demonstrate a control device without a charge trapping layer, which shows excellent thin film transistor characteristics. Published under license by AIP Publishing.

Item Type:	Journal Article
Publication:	APPLIED PHYSICS LETTERS
Publisher:	AMER INST PHYSICS
Additional Information:	Copyright of this article belongs to AMER INST PHYSICS
Department/Centre:	Division of Physical & Mathematical Sciences > Physics
Date Deposited:	24 May 2019 11:17
Last Modified:	24 May 2019 11:17
URI:	http://eprints.iisc.ac.in/id/eprint/62732

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