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Synthesis of phase pure vanadium dioxide (VO2) thin film by reactive pulsed laser deposition

Bhardwaj, Devanshi and Goswami, Ankur and Umarji, AM (2018) Synthesis of phase pure vanadium dioxide (VO2) thin film by reactive pulsed laser deposition. In: JOURNAL OF APPLIED PHYSICS, 124 (13).

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Official URL: http://dx.doi.org/10.1063/1.5046455


Thin films of phase pure VO2 (M1 phase) are deposited on thermally grown oxide (Si/SiO2) substrate by reactive pulsed laser deposition of vanadium metal target. The influence of deposition parameters is studied by varying oxygen partial pressure while keeping other parameters constant. A thin film obtained at 50 mTorr is found to be phase pure by XRD and Raman spectral studies. SEM and AFM studies show smooth morphology with a surface roughness of 3-5 nm. The quality of the thin film was further established by characterizing the 68 degrees C (T-SMT) transition by 2-3 orders of jump in resistance and a 60% change in reflectivity with minimum hysteresis. This single step process of deposition would be a suitable method for fabricating devices for smart window and metamaterial applications. Published by AIP Publishing.

Item Type: Journal Article
Additional Information: Copy right for this article belong to AMER INST PHYSICS
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 29 Oct 2018 15:31
Last Modified: 29 Oct 2018 15:31
URI: http://eprints.iisc.ac.in/id/eprint/60989

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