Influence of copper oxide grown on various conducting substrates towards improved performance for photoelectrocatalytic bacterial inactivation

Eswar, Neerugatti KrishnaRao and Gupta, Rimzhim and Ramamurthy, Praveen C and Madras, Giridhar (2018) Influence of copper oxide grown on various conducting substrates towards improved performance for photoelectrocatalytic bacterial inactivation. In: MOLECULAR CATALYSIS, 451 (SI). pp. 161-169.

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Abstract

This paper analyzes the role of the conducting layer substrates (Cu and fluorine-doped tin oxide (FTO)) on grown copper oxide (CuO) in order to improve the performance of catalytic bacterial inactivation. Growth of CuO onto Cu substrate was via thermal oxidation of Cu whereas hydrothermal method was employed for CuO growth onto Fro. The surface morphology of CuO varied with respect to the substrates choice and epitaxy, developing particulated thin film and thin film consisting vertically aligned nanorods on Cu and FTO, respectively. Photo- and electro-based reactions were carried out to understand the effect of light, bias, bias-catalyst and light-bias-catalyst combinations, respectively, for the fast killing of E. coli. The experimental results showed a striking improvement in photoelectrocatalytic inactivation of E. coil using plain fabricated copper oxide substrate. The choice of conducting substrate material plays a crucial role in terms of both morphology controlled CuO growth under different facile methods and also governs the electron transfer efficiency to achieve an improved catalytic efficiency. The reaction mechanism was discussed by deriving an appropriate detailed model which is able to predict the experimental data in all the cases. This study gives an insight on energy saving and less carbon footprint approach for bacterial killing in a short interval. (C) 2017 Elsevier B.V. All rights reserved.

Item Type:	Journal Article
Publication:	MOLECULAR CATALYSIS
Publisher:	ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
Additional Information:	Copyright of this article belong to ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
Department/Centre:	Division of Mechanical Sciences > Chemical Engineering Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	04 Jul 2018 14:42
Last Modified:	04 Jul 2018 14:42
URI:	http://eprints.iisc.ac.in/id/eprint/60150

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