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A sub-thermionic MoS2 FET with tunable transport

Bhattacharjee, Shubhadeep and Ganapathi, Kolla Lakshmi and Mohan, Sangeneni and Bhat, Navakanta (2017) A sub-thermionic MoS2 FET with tunable transport. In: APPLIED PHYSICS LETTERS, 111 (16).

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Official URL: http://doi.org/10.1063/1.4996953


The inability to scale supply voltage and hence reduce power consumption remains a serious challenge in modern nanotransistors. This arises primarily because the Sub-threshold Swing (SS) of the thermionic MOSFET, a measure of its switching efficiency, is restricted by the Boltzmann limit (k(B)T/q = 60 mV/dec at 300 K). Tunneling FETs, the most promising candidates to circumvent this limit, employ band-to-band tunneling, yielding very low OFF currents and steep SS but at the expense of severely degraded ON currents. In a completely different approach, by introducing concurrent tuning of thermionic and tunneling components through metal/semiconductor Schottky junctions, we achieve an amalgamation of steep SS and high ON currents in the same device. We demonstrate sub-thermionic transport sustained up to 4 decades with SSmin similar to 8.3 mV/dec and SSavg similar to 37.5(25) mV/dec for 4(3) dec in few layer MoS2 dual gated FETs (planar and CMOS compatible) using tunnel injected Schottky contacts for a highly scaled drain voltage of 10 mV, the lowest for any sub-thermionic devices. Furthermore, the same devices can be tuned to operate in the thermionic regime with a field effect mobility of similar to 84.3 cm(2) V-1 s(-1). A detailed mechanism involving the independent control of the Schottky barrier height and width through efficient device architecture and material processing elucidates the functioning of these devices. The Gate Tunable Thermionic Tunnel FET can function at a supply voltage of as low as 0.5 V, reducing power consumption dramatically. Published by AIP Publishing.

Item Type: Journal Article
Additional Information: Copy right for this article belongs to the AMER INST PHYSICS, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
Department/Centre: Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 11 Nov 2017 07:11
Last Modified: 11 Nov 2017 07:11
URI: http://eprints.iisc.ac.in/id/eprint/58198

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