Somaiah, Nalla and Sharma, Deepak and Kumar, Praveen (2016) Electric current induced forward and anomalous backward mass transport. In: JOURNAL OF PHYSICS D-APPLIED PHYSICS, 49 (20).
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Abstract
Multilayered test samples were fabricated in form of standard Blech structure, where W was used as the interlayer between SiO2 substrate and Cu film. Electromigration test was performed at 250 degrees C by passing an electric current with a nominal density of 3.9 x 10(10) A m(-2). In addition to the regular electromigration induced mass transport ensuing from the cathode towards the anode, we also observed anomalous mass transport from the anode to the cathode, depleting Cu from the anode as well. We propose an electromigration-thermomigration coupling based reasoning to explain the observed mass transport.
Item Type: | Journal Article |
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Publication: | JOURNAL OF PHYSICS D-APPLIED PHYSICS |
Publisher: | IOP PUBLISHING LTD |
Additional Information: | Copy right for this article belongs to the IOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND |
Keywords: | Blech structure; electromigration; thermomigration; electromigration-thermomigration coupling; thin films |
Department/Centre: | Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy) |
Date Deposited: | 10 Jun 2016 06:07 |
Last Modified: | 10 Jun 2016 06:07 |
URI: | http://eprints.iisc.ac.in/id/eprint/53870 |
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