Graphene as a diffusion barrier for isomorphous systems: Cu-Ni system

Roy, Apurba and Kumar, Punith MK and Srivastava, Chandan (2016) Graphene as a diffusion barrier for isomorphous systems: Cu-Ni system. In: CHEMICAL PHYSICS LETTERS, 646 . pp. 158-161.

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Abstract

Electrochemical exfoliation technique using the pyrophosphate anion derived from tetra sodium pyrophosphate was employed to produce graphene. As-synthesized graphene was then drop dried over a cold rolled Cu sheet. Ni coating was then electrodeposited over bare Cu and graphene-Cu substrates. Both substrates were then isothermally annealed at 800 degrees C for 3 h. WDS analysis showed substantial atomic diffusion in annealed Ni-Cu sample. Cu-graphene-Ni sample, on the other hand, showed negligible diffusion illustrating the diffusion barrier property of the graphene coating. (C) 2016 Elsevier B.V. All rights reserved.

Item Type:	Journal Article
Publication:	CHEMICAL PHYSICS LETTERS
Publisher:	ELSEVIER SCIENCE BV
Additional Information:	Copy right for this article belongs to the ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
Department/Centre:	Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Date Deposited:	02 Apr 2016 09:44
Last Modified:	02 Apr 2016 09:44
URI:	http://eprints.iisc.ac.in/id/eprint/53467

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