Saravanan, S and Mathai, Joseph C and Anantharaman, MR and Venkatachalam, S and Avasthi, DK and Singh, F (2005) Photoluminescence studies on RF plasma-polymerized thin films. In: Synthetic Metals, 155 (2). pp. 311-315.
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Abstract
Conjugated polymers in the form of thin films play an important role in the field of materials science due to their interesting properties. Polymer thin films find extensive applications in the fabrication of devices, such as light emitting devices, rechargeable batteries, super capacitors, and are used as intermetallic dielectrics and EMI shieldings. Polymer thin films prepared by plasma-polymerization are highly cross-linked, pinhole free, and their permittivity lie in the ultra low k-regime. Electronic and photonic applications of plasma-polymerized thin films attracted the attention of various researchers. Modification of polymer thin films by swift heavy ions is well established and ion irradiation of polymers can induce irreversible changes in their structural, electrical, and optical properties. Polyaniline and polyfurfural thin films prepared by RF plasma-polymerization were irradiated with 92 MeV silicon ions for various fluences of $1\hspace{5mm}\times\hspace{5mm}10^{11}\hspace{5mm}ions\hspace{5mm}cm^{-2}$, $1\hspace{5mm}\times\hspace{5mm}10^{12}\hspace{5mm}ions\hspace{5mm}cm^{-2}$, and $1\hspace{5mm}\times\hspace{5mm}10^{13}\hspace{5mm}ions\hspace{5mm}cm^{-2}$. FTIR have been recorded on the pristine and silicon ion irradiated polymer thin films for structural evaluation. Photoluminescence (PL) spectra were recorded for RF plasma-polymerized thin film samples before and after irradiation. In this paper the effect of swift heavy ions on the structural and photoluminescence spectra of plasma-polymerized thin films are investigated.
Item Type: | Journal Article |
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Publication: | Synthetic Metals |
Publisher: | Elsevier Science BV |
Additional Information: | Copyright for this article belongs to Elsevier. |
Keywords: | Photoluminescence; Coatings; Polyaniline; Infrared and Raman spectroscopy; Chemical vapour deposition |
Department/Centre: | Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy) |
Date Deposited: | 24 Jan 2006 |
Last Modified: | 19 Sep 2010 04:23 |
URI: | http://eprints.iisc.ac.in/id/eprint/5194 |
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