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Fabrication and characterization of sub 100 nm period polymer gratings for photonics applications

Sangeeth, K and Hegde, GM (2014) Fabrication and characterization of sub 100 nm period polymer gratings for photonics applications. In: CURRENT SCIENCE, 107 (5). pp. 749-752.

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Official URL: http://www.currentscience.ac.in/Volumes/107/05/074...


We report on the fabrication of polymethylmethacrylate (PMMA) nanogratings on silicon (Si) and glass substrates using electron beam lithography technique. Various aspects of proximity corrections using Monte Carlo simulation have been discussed. The fabrication process parameters such as proximity gap of exposure, exposure dosage and developing conditions have been optimized for high-density PMMA nanogratings structure on Si and glass substrates. Electron beam exposure is adjusted in such a way that PMMA acts as a negative tone resist and at the same time resolution loss due to proximity effect is minimum. Both reflection and transmission-type, nanometre period gratings have been fabricated and their diffraction characteristics are evaluated.

Item Type: Journal Article
Additional Information: Copy right for this article belongs to the INDIAN ACAD SCIENCES, C V RAMAN AVENUE, SADASHIVANAGAR, P B #8005, BANGALORE 560 080, INDIA
Department/Centre: Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited: 12 Nov 2014 05:20
Last Modified: 12 Nov 2014 05:20
URI: http://eprints.iisc.ac.in/id/eprint/50229

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